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nB4 NanoBeam Elektron Demeti Litografi Sistemi

Bu sistem firmanın şu ana kadar en çok tercih edilen sistemi olmuştur detayları şu şekildedir.

The nB3 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB4 which has been developed to further reduce delivery times and service costs.

nB4 development aims:

  • Refine design and components to reduce routine service requirements.
  • Achieve a machine-fault-downtime of less than 5% annually.
  • Enhance performance
  • Facilitate volume production.

Specification comparison:

nB3

nB4

Beam Voltage range

30kV - 100kV

20kV - 100kV

Feature size on resist

<8nm

<8nm

Metal lift-off line width

20nm

20nm

Stitching/overlay error

<25nm for 500um field

<20nm for 500um field

 

Required regular service for

Average of 3 years

Expected

XY stage

2 years

> 5 years

optical column

6 years

> 10 years

loading robot

2 years

> 5 years


The nB4 system will provide a platform for further development to high deflection speed and further integrated electronics.

Daha fazla bilgiye firma sayfalarından ulaşabilirsiniz.

www.nanobeam.co.uk






 
NanoBeam UK EBL posteri (0.6 Mb)
 
 
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